Creation of reactive micro patterns on silicon by scanning electrochemical microscopy

Giovanni Valenti, Luca Bardini, Daria Bonazzi, Stefania Rapino, Massimo Marcaccio, Francesco Paolucci

Research output: Contribution to journalArticlepeer-review


A chemical route to locally etch the native silica film on silicon, using the SECM, thus creating patterns of reactive Si-H holes, is described. The procedure is based on the alteration of the pH in the volume between the SECM tip and the pristine p-Si substrate so as to turn locally the initially inert fluoride solution into a strong etchant capable to bear holes through the SiO2 native layer in a very controlled and highly reproducible way. The direct electrochemical grafting of p-NO2-benzene diazonium cation into the etched Si-H holes and the subsequent functionalization of the electrografted organic layer by either a fluorescent probe or a redox probe (HRP) were then used to highlight the versatility of this approach for the fabrication of micropatterned functional surfaces.

Original languageEnglish
Pages (from-to)22165-22170
Number of pages6
JournalJournal of Physical Chemistry C
Issue number50
Publication statusPublished - Dec 23 2010

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Energy(all)


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