Creation of reactive micro patterns on silicon by scanning electrochemical microscopy

Giovanni Valenti, Luca Bardini, Daria Bonazzi, Stefania Rapino, Massimo Marcaccio, Francesco Paolucci

Research output: Contribution to journalArticle

Abstract

A chemical route to locally etch the native silica film on silicon, using the SECM, thus creating patterns of reactive Si-H holes, is described. The procedure is based on the alteration of the pH in the volume between the SECM tip and the pristine p-Si substrate so as to turn locally the initially inert fluoride solution into a strong etchant capable to bear holes through the SiO2 native layer in a very controlled and highly reproducible way. The direct electrochemical grafting of p-NO2-benzene diazonium cation into the etched Si-H holes and the subsequent functionalization of the electrografted organic layer by either a fluorescent probe or a redox probe (HRP) were then used to highlight the versatility of this approach for the fabrication of micropatterned functional surfaces.

Original languageEnglish
Pages (from-to)22165-22170
Number of pages6
JournalJournal of Physical Chemistry C
Volume114
Issue number50
DOIs
Publication statusPublished - Dec 23 2010

Fingerprint

Silicon
Benzene
Fluorides
Fluorescent Dyes
Silicon Dioxide
Cations
Microscopic examination
microscopy
Scanning
Fabrication
scanning
silicon
Substrates
etchants
probes
Positive ions
Silica
versatility
bears
fluorides

ASJC Scopus subject areas

  • Physical and Theoretical Chemistry
  • Electronic, Optical and Magnetic Materials
  • Surfaces, Coatings and Films
  • Energy(all)

Cite this

Creation of reactive micro patterns on silicon by scanning electrochemical microscopy. / Valenti, Giovanni; Bardini, Luca; Bonazzi, Daria; Rapino, Stefania; Marcaccio, Massimo; Paolucci, Francesco.

In: Journal of Physical Chemistry C, Vol. 114, No. 50, 23.12.2010, p. 22165-22170.

Research output: Contribution to journalArticle

Valenti, G, Bardini, L, Bonazzi, D, Rapino, S, Marcaccio, M & Paolucci, F 2010, 'Creation of reactive micro patterns on silicon by scanning electrochemical microscopy', Journal of Physical Chemistry C, vol. 114, no. 50, pp. 22165-22170. https://doi.org/10.1021/jp1067928
Valenti, Giovanni ; Bardini, Luca ; Bonazzi, Daria ; Rapino, Stefania ; Marcaccio, Massimo ; Paolucci, Francesco. / Creation of reactive micro patterns on silicon by scanning electrochemical microscopy. In: Journal of Physical Chemistry C. 2010 ; Vol. 114, No. 50. pp. 22165-22170.
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