Exploiting substrate stress to modify nanoscale SAM patterns

Chetana Singh, Alicia M. Jackson, Francesco Stellacci, Sharon C. Glotzer

Research output: Contribution to journalArticle

Abstract

(Figure Presented) We describe a simple method based on postadsorption substrate stress induction to modify and control nanoscale phase-separated patterns formed in self-assembled monolayers. We show using mesoscale computer simulations and experiments that this method helps quickly progress a kinetically arrested patchy pattern into the equilibrium striped pattern, which is otherwise difficult to access. This work also establishes the role of curvature in the formation of aligned stripes several molecules wide on spherical nanoparticles and nanocylinders.

Original languageEnglish
Pages (from-to)16377-16379
Number of pages3
JournalJournal of the American Chemical Society
Volume131
Issue number45
DOIs
Publication statusPublished - 2009

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Phase control
Self assembled monolayers
Nanoparticles
Molecules
Computer simulation
Substrates
Computer Simulation
Experiments

ASJC Scopus subject areas

  • Chemistry(all)
  • Catalysis
  • Biochemistry
  • Colloid and Surface Chemistry

Cite this

Singh, C., Jackson, A. M., Stellacci, F., & Glotzer, S. C. (2009). Exploiting substrate stress to modify nanoscale SAM patterns. Journal of the American Chemical Society, 131(45), 16377-16379. https://doi.org/10.1021/ja9063876

Exploiting substrate stress to modify nanoscale SAM patterns. / Singh, Chetana; Jackson, Alicia M.; Stellacci, Francesco; Glotzer, Sharon C.

In: Journal of the American Chemical Society, Vol. 131, No. 45, 2009, p. 16377-16379.

Research output: Contribution to journalArticle

Singh, C, Jackson, AM, Stellacci, F & Glotzer, SC 2009, 'Exploiting substrate stress to modify nanoscale SAM patterns', Journal of the American Chemical Society, vol. 131, no. 45, pp. 16377-16379. https://doi.org/10.1021/ja9063876
Singh, Chetana ; Jackson, Alicia M. ; Stellacci, Francesco ; Glotzer, Sharon C. / Exploiting substrate stress to modify nanoscale SAM patterns. In: Journal of the American Chemical Society. 2009 ; Vol. 131, No. 45. pp. 16377-16379.
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