TY - JOUR
T1 - Roughness conformality during thin films deposition onto rough substrates: A quantitative study
AU - Berni, Matteo
AU - Bontempi, Marco
AU - Marchiori, Gregorio
AU - Gambardella, Alessandro
N1 - Funding Information:
The authors would like to thank INAIL-Istituto Nazionale Assicurazione Infortuni sul Lavoro (National Institute for Insurance against Accidents at Work) funding (CUP = E55F16000020005) provided by Rizzoli Orthopedic Institute and the ISMN-CNR@spmlab staff together with Mr. Federico Bona who provided technical and scientific support.
Publisher Copyright:
© 2020 Elsevier B.V.
Copyright:
Copyright 2020 Elsevier B.V., All rights reserved.
PY - 2020/9/1
Y1 - 2020/9/1
N2 - This work aims to develop a tool to quantitatively connect the surfaces of a thin film and the substrate underneath during growth. To this purpose, it is suggested that at microscopic scales the surface of a rough substrate can be conveniently treated as a set of spatial wavelengths, whose periodicities undergo a gradual modification upon arrival of the depositing species and consequent formation of the front roughness. This enables the implementation of approximate models based on local roughening of surfaces to follow the evolution of morphology during growth. Focused primarily on situations in which growth models based on idealized deposition conditions are no longer valid, as typically happens under shadowing instability, the methodology detailed here is potentially capable to cover a broad class of thin-film processes with impact on many technological and industrial applications. As an example, two different batches of thin films, namely a ceramic (zirconia) and a metal (silver) deposited by pulsed electron ablation on rough substrates, are investigated. Our results agree well with expectations related to the different response to ablation of the used materials and, at the same time, match with the previously observed kinetic of formation of the surfaces under mainly nonideal conditions.
AB - This work aims to develop a tool to quantitatively connect the surfaces of a thin film and the substrate underneath during growth. To this purpose, it is suggested that at microscopic scales the surface of a rough substrate can be conveniently treated as a set of spatial wavelengths, whose periodicities undergo a gradual modification upon arrival of the depositing species and consequent formation of the front roughness. This enables the implementation of approximate models based on local roughening of surfaces to follow the evolution of morphology during growth. Focused primarily on situations in which growth models based on idealized deposition conditions are no longer valid, as typically happens under shadowing instability, the methodology detailed here is potentially capable to cover a broad class of thin-film processes with impact on many technological and industrial applications. As an example, two different batches of thin films, namely a ceramic (zirconia) and a metal (silver) deposited by pulsed electron ablation on rough substrates, are investigated. Our results agree well with expectations related to the different response to ablation of the used materials and, at the same time, match with the previously observed kinetic of formation of the surfaces under mainly nonideal conditions.
KW - Atomic force microscopy
KW - Coatings
KW - Conformal deposition
KW - Microscopy and microanalysis techniques
KW - Physical vapor deposition
KW - Power spectral density
KW - Roughness
KW - Thin films
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U2 - 10.1016/j.tsf.2020.138258
DO - 10.1016/j.tsf.2020.138258
M3 - Article
AN - SCOPUS:85088901028
VL - 709
SP - 1
EP - 10
JO - Thin Solid Films
JF - Thin Solid Films
SN - 0040-6090
ER -