Self-aligned nanolithography by selective polymer dissolution

Huijuan Zhang, Chee Leong Wong, Yufeng Hao, Rui Wang, Xiaogang Liu, Francesco Stellacci, John T L Thong

Research output: Contribution to journalArticle

Abstract

We report a novel approach to the fabrication of self-aligned nanoscale trench structures in a thin polymer layer covering on conductive materials. By passing AC current through a polymer-coated nanowire in the presence of an appropriate solvent, a self-aligned nanotrench is formed in the polymer overlayer as a result of accelerated dissolution while the rest of the device remains covered. Similar results have been achieved for polymer-coated graphene ribbons. Such polymer-protected devices in which only the active component is exposed should find important applications as electrical sensors in aqueous solutions, particularly in cases where parasitic ionic currents often obscure sensing signals.

Original languageEnglish
Pages (from-to)2302-2306
Number of pages5
JournalNanoscale
Volume2
Issue number10
DOIs
Publication statusPublished - Oct 2010

ASJC Scopus subject areas

  • Materials Science(all)

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  • Cite this

    Zhang, H., Wong, C. L., Hao, Y., Wang, R., Liu, X., Stellacci, F., & Thong, J. T. L. (2010). Self-aligned nanolithography by selective polymer dissolution. Nanoscale, 2(10), 2302-2306. https://doi.org/10.1039/c0nr00398k