Two-photon 3D lithography: Materials and applications

Stephen M. Kuebler, Kevin L. Braun, Francesco Stellacci, Christina A. Bauer, Marcus Halik, Wenhui Zhou, Tianyue Yu, Christopher K. Ober, Seth R. Marder, Joseph W. Perry

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

The design of organic molecules featuring large two-photon absorption cross sections that are of the form D-φ-D, A-φ-A, D-φ-A-φ-D, and A-φ-d-φ-A was reported. A nanocomposite approach was pursued to develop materials systems that allow for the laser writing of conductive metal features in a polymer matrix using one-photon or two-photon excitation. It was observed that completely free-form capability of two-photon lithography allows for the 3D fabrication of a wide range of periodic and non-periodic structures. It was shown that compounds with large twp-photon absorption cross sections and high photochemical reaction efficiencies have enabled the development of highly sensitive materials systems for two-photon 3D lithography.

Original languageEnglish
Title of host publicationConference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS
Pages561-562
Number of pages2
Volume2
Publication statusPublished - 2004
Event2004 IEEE LEOS Annual Meeting Conference Proceedings, LEOS 2004 - Rio Grande, Puerto Rico
Duration: Nov 7 2004Nov 11 2004

Other

Other2004 IEEE LEOS Annual Meeting Conference Proceedings, LEOS 2004
CountryPuerto Rico
CityRio Grande
Period11/7/0411/11/04

ASJC Scopus subject areas

  • Industrial and Manufacturing Engineering
  • Control and Systems Engineering
  • Electrical and Electronic Engineering

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