Two-photon 3D lithography: Materials and applications

Stephen M. Kuebler; Kevin L. Braun; Francesco Stellacci; Christina A. Bauer; Marcus Halik; Wenhui Zhou; Tianyue Yu; Christopher K. Ober; Seth R. Marder; Joseph W. Perry

Two-photon 3D lithography: Materials and applications

Stephen M. Kuebler, Kevin L. Braun, Francesco Stellacci, Christina A. Bauer, Marcus Halik, Wenhui Zhou, Tianyue Yu, Christopher K. Ober, Seth R. Marder, Joseph W. Perry

Fondazione IRCCS Istituto Neurologico "C. Besta"

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

The design of organic molecules featuring large two-photon absorption cross sections that are of the form D-φ-D, A-φ-A, D-φ-A-φ-D, and A-φ-d-φ-A was reported. A nanocomposite approach was pursued to develop materials systems that allow for the laser writing of conductive metal features in a polymer matrix using one-photon or two-photon excitation. It was observed that completely free-form capability of two-photon lithography allows for the 3D fabrication of a wide range of periodic and non-periodic structures. It was shown that compounds with large twp-photon absorption cross sections and high photochemical reaction efficiencies have enabled the development of highly sensitive materials systems for two-photon 3D lithography.

Original language	English
Title of host publication	Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS
Pages	561-562
Number of pages	2
Volume	2
Publication status	Published - 2004
Event	2004 IEEE LEOS Annual Meeting Conference Proceedings, LEOS 2004 - Rio Grande, Puerto Rico Duration: Nov 7 2004 → Nov 11 2004

Other

Other	2004 IEEE LEOS Annual Meeting Conference Proceedings, LEOS 2004
Country	Puerto Rico
City	Rio Grande
Period	11/7/04 → 11/11/04

ASJC Scopus subject areas

Industrial and Manufacturing Engineering
Control and Systems Engineering
Electrical and Electronic Engineering

Fingerprint Dive into the research topics of 'Two-photon 3D lithography: Materials and applications'. Together they form a unique fingerprint.

Cite this

Two-photon 3D lithography : Materials and applications. / Kuebler, Stephen M.; Braun, Kevin L.; Stellacci, Francesco; Bauer, Christina A.; Halik, Marcus; Zhou, Wenhui; Yu, Tianyue; Ober, Christopher K.; Marder, Seth R.; Perry, Joseph W.

Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS. Vol. 2 2004. p. 561-562.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Kuebler, SM, Braun, KL, Stellacci, F, Bauer, CA, Halik, M, Zhou, W, Yu, T, Ober, CK, Marder, SR & Perry, JW 2004, Two-photon 3D lithography: Materials and applications. in Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS. vol. 2, pp. 561-562, 2004 IEEE LEOS Annual Meeting Conference Proceedings, LEOS 2004, Rio Grande, Puerto Rico, 11/7/04.

@inproceedings{edfc0eecf3e3455fa2f547daf1b34f7d,

title = "Two-photon 3D lithography: Materials and applications",

abstract = "The design of organic molecules featuring large two-photon absorption cross sections that are of the form D-φ-D, A-φ-A, D-φ-A-φ-D, and A-φ-d-φ-A was reported. A nanocomposite approach was pursued to develop materials systems that allow for the laser writing of conductive metal features in a polymer matrix using one-photon or two-photon excitation. It was observed that completely free-form capability of two-photon lithography allows for the 3D fabrication of a wide range of periodic and non-periodic structures. It was shown that compounds with large twp-photon absorption cross sections and high photochemical reaction efficiencies have enabled the development of highly sensitive materials systems for two-photon 3D lithography.",

author = "Kuebler, {Stephen M.} and Braun, {Kevin L.} and Francesco Stellacci and Bauer, {Christina A.} and Marcus Halik and Wenhui Zhou and Tianyue Yu and Ober, {Christopher K.} and Marder, {Seth R.} and Perry, {Joseph W.}",

year = "2004",

language = "English",

volume = "2",

pages = "561--562",

booktitle = "Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS",

note = "2004 IEEE LEOS Annual Meeting Conference Proceedings, LEOS 2004 ; Conference date: 07-11-2004 Through 11-11-2004",

}

TY - GEN

T1 - Two-photon 3D lithography

T2 - 2004 IEEE LEOS Annual Meeting Conference Proceedings, LEOS 2004

AU - Kuebler, Stephen M.

AU - Braun, Kevin L.

AU - Stellacci, Francesco

AU - Bauer, Christina A.

AU - Halik, Marcus

AU - Zhou, Wenhui

AU - Yu, Tianyue

AU - Ober, Christopher K.

AU - Marder, Seth R.

AU - Perry, Joseph W.

PY - 2004

Y1 - 2004

N2 - The design of organic molecules featuring large two-photon absorption cross sections that are of the form D-φ-D, A-φ-A, D-φ-A-φ-D, and A-φ-d-φ-A was reported. A nanocomposite approach was pursued to develop materials systems that allow for the laser writing of conductive metal features in a polymer matrix using one-photon or two-photon excitation. It was observed that completely free-form capability of two-photon lithography allows for the 3D fabrication of a wide range of periodic and non-periodic structures. It was shown that compounds with large twp-photon absorption cross sections and high photochemical reaction efficiencies have enabled the development of highly sensitive materials systems for two-photon 3D lithography.

AB - The design of organic molecules featuring large two-photon absorption cross sections that are of the form D-φ-D, A-φ-A, D-φ-A-φ-D, and A-φ-d-φ-A was reported. A nanocomposite approach was pursued to develop materials systems that allow for the laser writing of conductive metal features in a polymer matrix using one-photon or two-photon excitation. It was observed that completely free-form capability of two-photon lithography allows for the 3D fabrication of a wide range of periodic and non-periodic structures. It was shown that compounds with large twp-photon absorption cross sections and high photochemical reaction efficiencies have enabled the development of highly sensitive materials systems for two-photon 3D lithography.

UR - http://www.scopus.com/inward/record.url?scp=20044391091&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=20044391091&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:20044391091

VL - 2

SP - 561

EP - 562

BT - Conference Proceedings - Lasers and Electro-Optics Society Annual Meeting-LEOS

Y2 - 7 November 2004 through 11 November 2004

ER -